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GD-023
GD-023
- Formula GdF3
- Purity 99.995
- Particle Size 1-4 mm
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GD-056
GD-056
- Formula Gd2O3
- Purity 99.99
- Particle Size 1-4 mm
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GE-004
GE-004
- Formula GeSb
- Purity 99.999
- Particle Size 3-6 mm
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GES-115
GES-115
- Formula GeS
- Purity 99.999
- Particle Size 3-6 mm
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GES-116
GES-116
- Formula GeS2
- Purity 99.999
- Particle Size 3-6 mm
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GESE-103
GESE-103
- Formula GeSe
- Purity 99.999
- Particle Size 3-6 mm
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GESE-104
GESE-104
- Formula GeSe2
- Purity 99.999
- Particle Size 3-6 mm
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GETE-129
GETE-129
- Formula GeTe
- Purity 99.9999
- Particle Size 3-6 mm
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HF-047
HF-047
- Formula HfN
- Purity 99.5 (Zr<0.15%)
- Particle Size 1-4 mm
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HF-057
HF-057
- Formula HfO2
- Purity 99.995 (Zr<0.25%)
- Particle Size 1-4 mm
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HF-058
HF-058
- Formula HfO2
- Purity 99.99 (Zr<0.25%)
- Particle Size 1-4 mm
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HF-059
HF-059
- Formula HfO2
- Purity 99.95
- Particle Size 1-4 mm
Product Search
Vapor Deposition Materials & Sputtering Targets
Uniquely fabricated forms of high purity metals and compounds used in various vapor deposition applications.
Sputtering targets are manufactured to custom specifications.
Vapor Deposition Spec Sheet & Request Form
Vapor Deposition Spec Sheet & Request Form
