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Aluminum Nitride Sputtering Targets – AL-580
Formula: AlN 40.99
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Purity99.5-99.9
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Particle Sizeinquire
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CAS24304-00-5
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Melting Point2200oC / 3992oF
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Density3.26 G/cm3
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CompositionAl - 65.8 , N - 34.2
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Crystal StructureHex
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FormSputtering Targets
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ApplicationsThin Film Deposition / Optical Coatings
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Mohs Hardness @ 20oC09-Oct
Specifications
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Weight (lbs)Price
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1-2inquire
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3-10inquire
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11-25inquire
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26-100inquire
Cost Per Pound
Purity : 99.5-99.9
Particle Size : inquire
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Aluminum Oxide Sputtering Targets
Formula: Al2O3 101.96
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Purity99.99+
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Particle Sizeinquire
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CAS1344-28-1
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Melting Point2072oC / 3761.6oF
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Boiling Point2980oC / 5396oF
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Density3.965 G/cm3
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Crystal StructureHexagonal
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Electric Resistivity1x1022 [μΩ·cm]
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FormSputtering Targets
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ApplicationsThin Film Deposition / Optical Coatings
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Mohs Hardness @ 20oC9
Specifications
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Weight (lbs)Price
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1-2inquire
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3-10inquire
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11-25inquire
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26-100inquire
Cost Per Pound
Purity : 99.99+
Particle Size : inquire
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Antimony Sputtering Targets – AN-180
Formula: 51 Sb 121.75
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Purity99.999%
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Particle Sizeinquire
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CAS7440-36-0
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Melting Point630.5oC / 1166.9oF
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Boiling Point1750oC / 3182oF
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Density6.618 G/cm3
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Coef. of Expansion @ 20oC8.11 μm/moK
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Crystal StructureRhombohedral
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Electric Resistivity39.1 [μΩ·cm]
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FormPieces
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ApplicationsThin Film Deposition / Optical Coatings
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Mohs Hardness @ 20oC3.25
Specifications
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Weight (lbs)Price
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1-2inquire
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3-10inquire
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11-25inquire
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26-100inquire
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100Hazardous
Cost Per Pound
Purity : 99.999%
Particle Size : inquire
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Bismuth Sputtering Targets
Formula: 83 Bi 208.98
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Purity99.99 - 99.999
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Particle Sizeinquire
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CAS7440-69-9
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Melting Point271.3oC / 520.34oF
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Boiling Point1560oC / 2840oF
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Density9.8 G/cm3
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Coef. of Expansion @ 20oC13.3 x 10-6
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Crystal StructureRhombohedral
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Electric Resistivity106.8 [μΩ·cm]
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FormSputtering Targets
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ApplicationsThin Film Deposition / Optical Coatings
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Mohs Hardness @ 20oC2.5
Specifications
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Weight (lbs)Price
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1-2inquire
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3-10inquire
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11-25inquire
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26-100inquire
Cost Per Pound
Purity : 99.99 - 99.999
Particle Size : inquire
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Bismuth Trioxide Sputtering Target – BI-650
Formula: Bi2O3 465.92
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Purity99.99+
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Particle Sizeinquire
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CAS1304-76-3
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Boiling Point1560oC / 2840oF
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Density8.76 G/cm3
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CompositionBi - 89.7, O - 10.3
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FormSputtering Targets
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ApplicationsSemiconductor
Specifications
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Weight (lbs)Price
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1-2inquire
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3-10inquire
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11-25inquire
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26-100inquire
Cost Per Pound
Purity : 99.99+
Particle Size : inquire
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Boron Carbide Sputtering Targets
Formula: B4C 55.26
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Purity99.5-99.9
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Particle Sizeinquire
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CAS12069-32-8
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Melting Point2350oC / 4262oF
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Boiling Point3500oC / 6332oF
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Density2.52 G/cm3
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CompositionC - 21.7, B - 78.3
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Crystal StructureRhombohedral
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Electric Resistivity0.3-0.8 [μΩ·cm]
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FormSputtering Targets
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ApplicationsThin Film Deposition / Optical Coatings
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Mohs Hardness @ 20oC9.3
Specifications
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Weight (lbs)Price
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1-2inquire
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3-10inquire
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11-25inquire
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26-100inquire
Cost Per Pound
Purity : 99.5-99.9
Particle Size : inquire
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Boron Nitride Sputtering Targets
Formula: BN 24.82
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Purity99.5%
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Particle Sizeinquire
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CAS10043-11-5
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Melting Point3000oC / 5432oF
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Density2.25 G/cm3
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CompositionB - 43.6, N - 56.4
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Crystal StructureHex
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FormSputtering Targets
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ApplicationsThin Film Deposition / Optical Coatings
Specifications
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Weight (lbs)Price
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1-2inquire
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3-10inquire
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11-25inquire
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26-100inquire
Cost Per Pound
Purity : 99.5%
Particle Size : inquire
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Boron Sputtering Targets
Formula: 5 B 10.811
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Purity99.9-99.999
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Particle Sizeinquire
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CAS7440-42-8
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Melting Point2100oC / 3812oF
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Boiling Point2600oC / 4712oF
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Crystal StructureHex
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Electric Resistivity4 x 106 [μΩ·cm]
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FormSputtering Targets
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Mohs Hardness @ 20oC9.3
Specifications
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Weight (lbs)Price
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1-2inquire
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3-10inquire
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11-25inquire
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26-100inquire
Cost Per Pound
Purity : 99.9-99.999
Particle Size : inquire
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Chromium Disilicide Sputtering Targets
Formula: CrSi2 108.17
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Purity99.5%
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Particle Sizeinquire
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CAS12018-09-6
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Melting Point1490oC / 2714oF
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Density5.5 G/cm3
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Crystal StructureTetrahedral
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FormSputtering Targets
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ApplicationsThin Film Deposition / Optical Coatings
Specifications
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Weight (lbs)Price
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1-2inquire
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3-10inquire
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11-25inquire
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26-100inquire
Cost Per Pound
Purity : 99.5%
Particle Size : inquire
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Chromium Sputtering Targets
Formula: 24 Cr 51.996
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Purity99.95-99.99
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Particle Sizeinquire
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CAS7440-47-3
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Melting Point1875oC / 3407oF
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Boiling Point2475oC / 4487oF
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Density7.19 G/cm3
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Coef. of Expansion @ 20oC6.2 x 10-6
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Crystal StructureCubic, Body Centered
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Electric Resistivity12.9 [μΩ·cm]
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FormSputtering Targets
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ApplicationsThin Film Deposition / Optical Coatings
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Mohs Hardness @ 20oC9
Specifications
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Weight (lbs)Price
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1-2inquire
-
3-10inquire
-
11-25inquire
-
26-100inquire
Cost Per Pound
Purity : 99.95-99.99
Particle Size : inquire
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Cobalt Oxide Sputtering Targets
Formula: Co3O4 240.80
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Purity99.95%
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Particle Size2-3" diameter x 0.125-0.25" thick
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CAS1308-06-1
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Melting Point1795oC / 3263oF
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Density6.45 G/cm3
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CompositionCo - 73.4, O - 26.6
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Crystal StructureCubic
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FormSputtering Targets
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ApplicationsThin Film Deposition / Optical Coatings
Specifications
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Weight (lbs)Price
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1-2inquire
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3-10inquire
-
11-25inquire
-
26-100inquire
Cost Per Pound
Purity : 99.95%
Particle Size : 2-3" diameter x 0.125-0.25" thick
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Cobalt Sputtering Targets
Formula: 27 Co 58.933
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Purity99.95-99.99
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Particle Sizeinquire
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CAS7440-48-4
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Melting Point1495oC / 2723oF
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Boiling Point2900oC / 5252oF
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Density8.92 G/cm3
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Coef. of Expansion @ 20oC12.5 x 10-6
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Crystal StructureHex
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Electric Resistivity6.24 [μΩ·cm]
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FormSputtering Targets
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ApplicationsThin Film Deposition / Optical Coatings
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NotesVickers Hardness at 20 degrees C is 253
Specifications
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Weight (lbs)Price
-
1-2inquire
-
3-10inquire
-
11-25inquire
-
26-100inquire
Cost Per Pound
Purity : 99.95-99.99
Particle Size : inquire
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