Aluminum Nitride Sputtering Targets – AL-580
Formula: AlN^40.99

Product Inquiry Technical Docs

Specifications

Purity

99.5-99.9

Particle Size

inquire

CAS

24304-00-5

Melting Point

2200^oC / 3992^oF

Density

3.26 G/cm³

Composition

Al - 65.8 , N - 34.2

Crystal Structure

Hex

Form

Sputtering Targets

Applications

Thin Film Deposition / Optical Coatings

Mohs Hardness @ 20^oC

09-Oct

Cost Per Pound

Weight (lbs)

Price

1-2

inquire

3-10

inquire

11-25

inquire

26-100

inquire
Compare
Product Inquiry

Purity : 99.5-99.9

Particle Size : inquire
Aluminum Oxide Sputtering Targets
Formula: Al₂O₃^101.96

Product Inquiry Technical Docs

Specifications

Purity

99.99+

Particle Size

inquire

CAS

1344-28-1

Melting Point

2072^oC / 3761.6^oF

Boiling Point

2980^oC / 5396^oF

Density

3.965 G/cm³

Crystal Structure

Hexagonal

Electric Resistivity

1x1022 [μΩ·cm]

Form

Sputtering Targets

Applications

Thin Film Deposition / Optical Coatings

Mohs Hardness @ 20^oC

9

Cost Per Pound

Weight (lbs)

Price

1-2

inquire

3-10

inquire

11-25

inquire

26-100

inquire
Compare
Product Inquiry

Purity : 99.99+

Particle Size : inquire
Antimony Sputtering Targets – AN-180
Formula: ₅₁Sb^121.75

Product Inquiry Technical Docs

Specifications

Purity

99.999%

Particle Size

inquire

CAS

7440-36-0

Melting Point

630.5^oC / 1166.9^oF

Boiling Point

1750^oC / 3182^oF

Density

6.618 G/cm³

Coef. of Expansion @ 20^oC

8.11 μm/moK

Crystal Structure

Rhombohedral

Electric Resistivity

39.1 [μΩ·cm]

Form

Pieces

Applications

Thin Film Deposition / Optical Coatings

Mohs Hardness @ 20^oC

3.25

Cost Per Pound

Weight (lbs)

Price

1-2

inquire

3-10

inquire

11-25

inquire

26-100

inquire

100

Hazardous
Compare
Product Inquiry

Purity : 99.999%

Particle Size : inquire
Bismuth Sputtering Targets
Formula: ₈₃Bi^208.98

Product Inquiry Technical Docs

Specifications

Purity

99.99 - 99.999

Particle Size

inquire

CAS

7440-69-9

Melting Point

271.3^oC / 520.34^oF

Boiling Point

1560^oC / 2840^oF

Density

9.8 G/cm³

Coef. of Expansion @ 20^oC

13.3 x 10-6

Crystal Structure

Rhombohedral

Electric Resistivity

106.8 [μΩ·cm]

Form

Sputtering Targets

Applications

Thin Film Deposition / Optical Coatings

Mohs Hardness @ 20^oC

2.5

Cost Per Pound

Weight (lbs)

Price

1-2

inquire

3-10

inquire

11-25

inquire

26-100

inquire
Compare
Product Inquiry

Purity : 99.99 - 99.999

Particle Size : inquire
Bismuth Trioxide Sputtering Target – BI-650
Formula: Bi₂O₃^465.92

Product Inquiry Technical Docs

Specifications

Purity

99.99+

Particle Size

inquire

CAS

1304-76-3

Boiling Point

1560^oC / 2840^oF

Density

8.76 G/cm³

Composition

Bi - 89.7, O - 10.3

Form

Sputtering Targets

Applications

Semiconductor

Cost Per Pound

Weight (lbs)

Price

1-2

inquire

3-10

inquire

11-25

inquire

26-100

inquire
Compare
Product Inquiry

Purity : 99.99+

Particle Size : inquire
Boron Carbide Sputtering Targets
Formula: B₄C^55.26

Product Inquiry Technical Docs

Specifications

Purity

99.5-99.9

Particle Size

inquire

CAS

12069-32-8

Melting Point

2350^oC / 4262^oF

Boiling Point

3500^oC / 6332^oF

Density

2.52 G/cm³

Composition

C - 21.7, B - 78.3

Crystal Structure

Rhombohedral

Electric Resistivity

0.3-0.8 [μΩ·cm]

Form

Sputtering Targets

Applications

Thin Film Deposition / Optical Coatings

Mohs Hardness @ 20^oC

9.3

Cost Per Pound

Weight (lbs)

Price

1-2

inquire

3-10

inquire

11-25

inquire

26-100

inquire
Compare
Product Inquiry

Purity : 99.5-99.9

Particle Size : inquire
Boron Nitride Sputtering Targets
Formula: BN^24.82

Product Inquiry Technical Docs

Specifications

Purity

99.5%

Particle Size

inquire

CAS

10043-11-5

Melting Point

3000^oC / 5432^oF

Density

2.25 G/cm³

Composition

B - 43.6, N - 56.4

Crystal Structure

Hex

Form

Sputtering Targets

Applications

Thin Film Deposition / Optical Coatings

Cost Per Pound

Weight (lbs)

Price

1-2

inquire

3-10

inquire

11-25

inquire

26-100

inquire
Compare
Product Inquiry

Purity : 99.5%

Particle Size : inquire
Boron Sputtering Targets
Formula: ₅B^10.811

Product Inquiry Technical Docs

Specifications

Purity

99.9-99.999

Particle Size

inquire

CAS

7440-42-8

Melting Point

2100^oC / 3812^oF

Boiling Point

2600^oC / 4712^oF

Crystal Structure

Hex

Electric Resistivity

4 x 106 [μΩ·cm]

Form

Sputtering Targets

Mohs Hardness @ 20^oC

9.3

Cost Per Pound

Weight (lbs)

Price

1-2

inquire

3-10

inquire

11-25

inquire

26-100

inquire
Compare
Product Inquiry

Purity : 99.9-99.999

Particle Size : inquire
Chromium Disilicide Sputtering Targets
Formula: CrSi₂^108.17

Product Inquiry Technical Docs

Specifications

Purity

99.5%

Particle Size

inquire

CAS

12018-09-6

Melting Point

1490^oC / 2714^oF

Density

5.5 G/cm³

Crystal Structure

Tetrahedral

Form

Sputtering Targets

Applications

Thin Film Deposition / Optical Coatings

Cost Per Pound

Weight (lbs)

Price

1-2

inquire

3-10

inquire

11-25

inquire

26-100

inquire
Compare
Product Inquiry

Purity : 99.5%

Particle Size : inquire
Chromium Sputtering Targets
Formula: ₂₄Cr^51.996

Product Inquiry Technical Docs

Specifications

Purity

99.95-99.99

Particle Size

inquire

CAS

7440-47-3

Melting Point

1875^oC / 3407^oF

Boiling Point

2475^oC / 4487^oF

Density

7.19 G/cm³

Coef. of Expansion @ 20^oC

6.2 x 10-6

Crystal Structure

Cubic, Body Centered

Electric Resistivity

12.9 [μΩ·cm]

Form

Sputtering Targets

Applications

Thin Film Deposition / Optical Coatings

Mohs Hardness @ 20^oC

9

Cost Per Pound

Weight (lbs)

Price

1-2

inquire

3-10

inquire

11-25

inquire

26-100

inquire
Compare
Product Inquiry

Purity : 99.95-99.99

Particle Size : inquire
Cobalt Oxide Sputtering Targets
Formula: Co₃O₄^240.80

Product Inquiry Technical Docs

Specifications

Purity

99.95%

Particle Size

2-3" diameter x 0.125-0.25" thick

CAS

1308-06-1

Melting Point

1795^oC / 3263^oF

Density

6.45 G/cm³

Composition

Co - 73.4, O - 26.6

Crystal Structure

Cubic

Form

Sputtering Targets

Applications

Thin Film Deposition / Optical Coatings

Cost Per Pound

Weight (lbs)

Price

1-2

inquire

3-10

inquire

11-25

inquire

26-100

inquire
Compare
Product Inquiry

Purity : 99.95%

Particle Size : 2-3" diameter x 0.125-0.25" thick
Cobalt Sputtering Targets
Formula: ₂₇Co^58.933

Product Inquiry Technical Docs

Specifications

Purity

99.95-99.99

Particle Size

inquire

CAS

7440-48-4

Melting Point

1495^oC / 2723^oF

Boiling Point

2900^oC / 5252^oF

Density

8.92 G/cm³

Coef. of Expansion @ 20^oC

12.5 x 10-6

Crystal Structure

Hex

Electric Resistivity

6.24 [μΩ·cm]

Form

Sputtering Targets

Applications

Thin Film Deposition / Optical Coatings

Notes

Vickers Hardness at 20 degrees C is 253

Cost Per Pound

Weight (lbs)

Price

1-2

inquire

3-10

inquire

11-25

inquire

26-100

inquire
Compare
Product Inquiry

Purity : 99.95-99.99

Particle Size : inquire

Backed by Over 50 Years of Experience

Vapor Deposition Materials

Specifications

Cost Per Pound

Specifications

Cost Per Pound

Specifications

Cost Per Pound

Specifications

Cost Per Pound

Specifications

Cost Per Pound

Specifications

Cost Per Pound

Specifications

Cost Per Pound

Specifications

Cost Per Pound

Specifications

Cost Per Pound

Specifications

Cost Per Pound

Specifications

Cost Per Pound

Specifications

Cost Per Pound

Product Categories

Chromium Metal Powder

Tantalum Metal Powder

Aluminum Powder

Nickel Metal Flake

Molybdenum Carbide Powder

Boron Carbide Powder

Boron Carbide Powder