Vapor Deposition Materials Archives - Page 2 of 3 - Micron Metals

Copper Metal Sputtering Targets
Formula: ₂₉Cu^63.546

Product Inquiry Technical Docs

Specifications

Purity

99.99-99.995

Particle Size

inquire

CAS

7440-50-8

Melting Point

1083^oC / 1981.4^oF

Boiling Point

2595^oC / 4703^oF

Density

8.94 G/cm³

Coef. of Expansion @ 20^oC

16.42 x 10-6

Crystal Structure

Cubic, Face Centered

Electric Conductance

0.593

Form

Sputtering Targets

Applications

Thin Film Deposition / Optical Coatings

Mohs Hardness @ 20^oC

3

Cost Per Pound

Weight (lbs)

Price

1-2

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3-10

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11-25

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26-100

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Purity : 99.99-99.995

Particle Size : inquire
Germanium Dioxide Sputtering Targets
Formula: GeO₂^104.61

Product Inquiry Technical Docs

Specifications

Purity

99.99%

Particle Size

inquire

CAS

1310-53-8

Melting Point

1115^oC / 2039^oF

Density

6.24 G/cm³

Crystal Structure

Hex

Form

Sputtering Targets

Applications

Thin Film Deposition / Optical Coatings

Cost Per Pound

Weight (lbs)

Price

1-2

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3-10

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11-25

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26-100

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Purity : 99.99%

Particle Size : inquire
Hafnium Carbide Sputtering Targets
Formula: HfC^190.50

Product Inquiry Technical Docs

Specifications

Purity

99.5-99.95

Particle Size

inquire

CAS

12069-85-1

Melting Point

4160^oC / 7520^oF

Density

12.2 G/cm³

Crystal Structure

Cubic

Electric Resistivity

109 [μΩ·cm]

Form

Sputtering Targets

Applications

Thin Film Deposition / Optical Coatings

Cost Per Pound

Weight (lbs)

Price

1-2

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3-10

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11-25

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26-100

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Product Inquiry

Purity : 99.5-99.95

Particle Size : inquire
Hafnium Metal Sputtering Targets
Formula: ₇₂Hf^178.49

Product Inquiry Technical Docs

Specifications

Purity

99.95%

Particle Size

inquire

CAS

7440-58-6

Melting Point

2222^oC / 4031.6^oF

Boiling Point

5400^oC / 9752^oF

Density

13.09 G/cm³

Coef. of Expansion @ 20^oC

5.9 x 10-6

Crystal Structure

Hex

Electric Resistivity

35.1 [μΩ·cm]

Form

Sputtering Targets

Applications

Thin Film Deposition / Optical Coatings

Cost Per Pound

Weight (lbs)

Price

1-2

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3-10

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11-25

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26-100

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Product Inquiry

Purity : 99.95%

Particle Size : inquire
Hafnium Oxide Sputtering Targets
Formula: HfO₂^210.49

Product Inquiry Technical Docs

Specifications

Purity

99.95%

Particle Size

inquire

CAS

12055-23-1

Melting Point

2758^oC / 4996.4^oF

Boiling Point

5400^oC / 9752^oF

Density

9.68 G/cm³

Crystal Structure

Cubic

Electric Resistivity

4.5 x 103 [μΩ·cm]

Form

Sputtering Targets

Applications

Thin Film Deposition / Optical Coatings

Cost Per Pound

Weight (lbs)

Price

1-2

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3-10

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11-25

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26-100

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Product Inquiry

Purity : 99.95%

Particle Size : inquire
Hafnium Silicide Sputtering Targets
Formula: HfSi₂^234.66

Product Inquiry Technical Docs

Specifications

Purity

99.8%

Particle Size

-325 Mesh

CAS

12401-56-8

Melting Point

1680^oC / 3056^oF

Density

8.02 G/cm³

Form

Sputtering Targets

Applications

Thin Film Deposition / Optical Coatings

Cost Per Pound

Weight (lbs)

Price

1-2

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3-10

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11-25

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26-100

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Purity : 99.8%

Particle Size : -325 Mesh
Indium Oxide Sputtering Targets
Formula: In₂O₃^277.64

Product Inquiry Technical Docs

Specifications

Purity

99.99-99.995

Particle Size

inquire

CAS

1312-43-2

Melting Point

850^oC / 1562^oF

Density

0.65 G/cm³

Composition

In - 82.71, O - 17.29

Form

Sputtering Targets

Applications

Thin Film Deposition / Optical Coatings

Cost Per Pound

Weight (lbs)

Price

1-2

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3-10

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11-25

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26-100

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Product Inquiry

Purity : 99.99-99.995

Particle Size : inquire
Iron Metal Pieces
Formula: ₂₆Fe^55.847

Product Inquiry Technical Docs

Specifications

Purity

99.995%

Particle Size

1-4 mm

CAS

7439-89-6

Melting Point

1536^oC / 2796.8^oF

Boiling Point

3000^oC / 5432^oF

Density

7.87 G/cm³

Brinnell Hardness

82-100

Coef. of Expansion @ 20^oC

12.6 x 10-6

Crystal Structure

Cubic, Body Centered

Electric Resistivity

9.71 [μΩ·cm]

Form

Pieces

Applications

Alloys / Customer Manufacturing / General Industrial Use

Cost Per Pound

Weight (lbs)

Price

1-2

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3-10

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11-25

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26-100

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Product Inquiry

Purity : 99.995%

Particle Size : 1-4 mm
Magnesium Oxide Sputtering Targets
Formula: MgO^40.30

Product Inquiry Technical Docs

Specifications

Purity

99.95-99.99

Particle Size

inquire

CAS

1309-48-4

Melting Point

2852^oC / 5165.6^oF

Boiling Point

3600^oC / 6512^oF

Density

3.58 G/cm³

Composition

Mg: 60.32, O: 39.68

Crystal Structure

Cubic

Electric Resistivity

2 x 1014 [μΩ·cm]

Form

Sputtering Targets

Applications

Thin Film Deposition / Optical Coatings

Mohs Hardness @ 20^oC

6

Cost Per Pound

Weight (lbs)

Price

1-2

inquire

3-10

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26-100

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Product Inquiry

Purity : 99.95-99.99

Particle Size : inquire
Manganese Metal Sputtering Targets
Formula: ₂₅Mn^54.938

Product Inquiry Technical Docs

Specifications

Purity

99.95-99.99

Particle Size

inquire

CAS

7439-96-5

Melting Point

1245^oC / 2273^oF

Boiling Point

2150^oC / 3902^oF

Density

7.43 G/cm³

Coef. of Expansion @ 20^oC

22 x 10-6

Crystal Structure

Cubic

Form

Sputtering Targets

Applications

Thin Film Deposition / Optical Coatings

Mohs Hardness @ 20^oC

5

Cost Per Pound

Weight (lbs)

Price

1-2

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3-10

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11-25

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26-100

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Product Inquiry

Purity : 99.95-99.99

Particle Size : inquire
Scandium Oxide
Formula: Sc₂O₃^137.91

Product Inquiry Technical Docs

Specifications

Purity

inquire

Particle Size

inquire

CAS

12060-08-1

Density

3.86 G/cm³

Crystal Structure

Cubic, Body Centered

Form

Sputtering Targets

Applications

Abrasives | Thin, Thick film

Notes

Unit cost and quantity - Inquire
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Product Inquiry

Purity : inquire

Particle Size : inquire
Tungsten Titanium Sputtering Targets
Product Inquiry Technical Docs

Specifications

Purity

99.95 min

Particle Size

inquire

CAS

W - 7440-33-7 / Ti - 7440-32-6

Form

Sputtering Targets

Applications

Thin Film Deposition / Optical Coatings

Cost Per Pound

Weight (lbs)

Price

1-2

inquire

3-10

inquire

11-25

inquire

26-100

inquire
Compare
Product Inquiry

Purity : 99.95 min

Particle Size : inquire

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