Description
Hafnium Oxide Sputtering Targets
*Prices are subject to change without notice due to market conditions.
Hafnium Oxide Sputtering Targets
Formula: HfO2 210.49
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Purity99.95%
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Particle Sizeinquire
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CAS12055-23-1
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Melting Point2758oC / 4996.4oF
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Boiling Point5400oC / 9752oF
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Density9.68 G/cm3
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Crystal StructureCubic
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Electric Resistivity4.5 x 103 [μΩ·cm]
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FormSputtering Targets
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ApplicationsThin Film Deposition / Optical Coatings
Specifications
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Weight (lbs)Price
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1-2inquire
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3-10inquire
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11-25inquire
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26-100inquire
Cost Per Pound
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