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AL-190
AL-190
- Formula -
- Purity 99.9 - 99.9995%
- Particle Size granules / custome made
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AL-180
ALUMINUM (Al) TARGET
- Formula -
- Purity -
- Particle Size -
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AN-180
AN-180
- Formula 51 Sb 121.75
- Purity 99.999
- Particle Size inquire
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CR-180
CHROMIUM SPUTTERING TARGET
- Formula Cr
- Purity 99.99% min
- Particle Size 100 mm diameter x 6 mm thick
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CU-910
COPPER SELENIDE GRANULES
- Formula CuSe 142.51
- Purity 99.999
- Particle Size 3-6 mm
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CU-901
COPPER SELENIDE POWDER
- Formula CuSe 142.51
- Purity 99.999
- Particle Size -200 Mesh
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HF-501
HAFNIUM NITRIDE POWDER
- Formula HfN
- Purity 99.9%
- Particle Size -325 mesh
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IN-901
IN-901
- Formula In2Se3 466.52
- Purity 99.99
- Particle Size -200 Mesh
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IN-910
INDIUM SELENIDE GRANULES
- Formula In2Se3 466.52
- Purity 99.99
- Particle Size 3-6 mm
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WP-500
WP-500
- Formula -
- Purity 99.95 min
- Particle Size inquire
Product Search
Vapor Deposition Materials & Sputtering Targets
Uniquely fabricated forms of high purity metals and compounds used in various vapor deposition applications.
Sputtering targets are manufactured to custom specifications.
Vapor Deposition Spec Sheet & Request Form
Vapor Deposition Spec Sheet & Request Form
