Description
Aluminum Nitride Sputtering Targets
*Prices are subject to change without notice due to market conditions.
Aluminum Nitride Sputtering Targets – AL-580
Formula: AlN 40.99
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Purity99.5-99.9
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Particle Sizeinquire
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CAS24304-00-5
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Melting Point2200oC / 3992oF
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Density3.26 G/cm3
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CompositionAl - 65.8 , N - 34.2
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Crystal StructureHex
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FormSputtering Targets
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ApplicationsThin Film Deposition / Optical Coatings
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Mohs Hardness @ 20oC09-Oct
Specifications
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Weight (lbs)Price
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1-2inquire
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3-10inquire
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11-25inquire
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26-100inquire
