Description
Aluminum Oxide Sputtering Targets
*Prices are subject to change without notice due to market conditions.
Aluminum Oxide Sputtering Targets
Formula: Al2O3 101.96
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Purity99.99+
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Particle Sizeinquire
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CAS1344-28-1
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Melting Point2072oC / 3761.6oF
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Boiling Point2980oC / 5396oF
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Density3.965 G/cm3
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Crystal StructureHexagonal
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Electric Resistivity1x1022 [μΩ·cm]
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FormSputtering Targets
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ApplicationsThin Film Deposition / Optical Coatings
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Mohs Hardness @ 20oC9
Specifications
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Weight (lbs)Price
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1-2inquire
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3-10inquire
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11-25inquire
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26-100inquire
