Description
Boron Nitride Sputtering Targets
*Prices are subject to change without notice due to market conditions.
Boron Nitride Sputtering Targets
Formula: BN 24.82
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Purity99.5%
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Particle Sizeinquire
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CAS10043-11-5
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Melting Point3000oC / 5432oF
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Density2.25 G/cm3
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CompositionB - 43.6, N - 56.4
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Crystal StructureHex
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FormSputtering Targets
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ApplicationsThin Film Deposition / Optical Coatings
Specifications
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Weight (lbs)Price
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1-2inquire
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3-10inquire
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11-25inquire
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26-100inquire
