Description
Hafnium Metal Sputtering Targets
*Prices are subject to change without notice due to market conditions.
Hafnium Metal Sputtering Targets
Formula: 72 Hf 178.49
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Purity99.95%
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Particle Sizeinquire
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CAS7440-58-6
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Melting Point2222oC / 4031.6oF
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Boiling Point5400oC / 9752oF
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Density13.09 G/cm3
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Coef. of Expansion @ 20oC5.9 x 10-6
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Crystal StructureHex
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Electric Resistivity35.1 [μΩ·cm]
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FormSputtering Targets
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ApplicationsThin Film Deposition / Optical Coatings
Specifications
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Weight (lbs)Price
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1-2inquire
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3-10inquire
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11-25inquire
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26-100inquire
